Novellus trial

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News Repligen begins Phase 1 study of RG Robert Graham, then senior vice president of Applied Materials, tried to persuade his company to purchase Novellus, but Applied Materials declined. With experience beginning Intel's Japanese operations, Graham began at Novellus by seeking Japanese distributors. In , Novellus shipped its first product: Concept One. Concept One is a two-part system, consisting of a machine that positions wafers for handling, and a processing chamber, where insulating or dielectric chemical films are deposited on the wafers.

At that time, the chemical vapor deposition market was dominated by U. This growth is even more astonishing when compared to the company's earlier compound annual growth rate of 28 percent between and Such demand for CVD technology was fueled, in part, by the rising demand for facsimile machines and car phones, and the advent of high definition television. These products utilize the CVD process because their complex structures use several levels of interconnecting circuits.

A potential long-range problem for those active in the CVD market was the cyclical nature of such technologies. In , Novellus CEO Robert Graham told Electronic Business that he anticipated another three to four years of spectacular growth for the CVD market before it would inevitably be supplanted by a newly developed technology.

Four segments define the CVD market: atmospheric, low pressure, plasma-enhanced, and photo. At this time, Novellus focused entirely on the largest of the four segments--the plasma-enhanced segment--which comprised over 50 percent of the entire CVD market.

Competitor Applied Materials, on the other hand, worked toward the creation of a machine that could handle multiple segments. In , a small number of companies dominated the U.

The top players included Novellus, Applied Materials, Inc. A stock sale helped Novellus retain a healthy amount of cash and an impressive balance sheet. In , the key to control of the CVD market was tungsten. Previously, aluminum was used to connect transistors on each layer of a device, as well as between layers.

However, with geometrics becoming narrower in modern devices, the sputtering technique used with aluminum became inadequate. Tungsten, on the other hand, fills the holes between layers or vias more uniformly. Taking advantage of this new technology to edge ahead of Applied Materials and Genus, Novellus broadened its offerings in , addressing the tungsten CVD market with its new Concept One-W.

This new system combined batch and wafer-at-a-time processing, creating uniform wafers in six-wafer chambers, where five were used for deposition and one for loading.

By handling five wafers at a time, the chip-making cost was reduced. A previous problem of tungsten deposit backslides was also solved with a combination of vacuum-clamping and gas-exclusion techniques. However, later in the year the company was hurt when the overall market fell. To make up for the domestic recession, Novellus became active in the international market, expanding into Japan--where 45 percent of the world's chips were now manufactured--and Europe.

The Japanese market paid off, helping to boost Novellus's sales in the first half of In fact, Japanese bookings accounted for over one-third of revenues, and total international business supplied well over 50 percent of the company's sales.

The company expanded to employ people, but continued to keep profit margins at 21 percent with a 29 percent return on shareholders' equity. Competition with Applied Materials continued to be a priority, with Novellus still ranking number 2 behind Applied for domestic business.

See Contacts and Locations. Study Description. Detailed Description:. Arms and Interventions. Outcome Measures. Secondary Outcome Measures : To evaluate the duration of response defined as time of initial response to progressive disease or death at the applicable RP2D in Dose Extension. Eligibility Criteria. Phase 1-Dose Escalation no longer enrolling as of Protocol Amendment 10 : Patients with histologically confirmed advanced solid tumors who are refractory to, relapsed after, or intolerant to standard therapy or for whom no standard therapy exists.

Following RP2D confirmation and redefinition, extension subjects must meet criteria for Cohort 1 and Cohort 2 as specified below: Phase 2a-Dose Extension-Cohort 1 Patients with solid tumors as of Amendment 10, only subjects with glioma tumors driven by a BRAF-V mutation Patients with no prior exposure to BRAF-directed therapy and for whom no standard therapy exists.

Patients with prior exposure to BRAF-directed therapy will be allowed, pending confirmation of mutations in either a re-biopsy or ctDNA, if the mutational profile identifies a potential for response based on PLX mechanism of action and after investigator discussion.

Adequate hematologic, hepatic, and renal function. Women of child-bearing potential must have a negative pregnancy test and must agree to use an effective form of contraception from the time of the negative pregnancy test up to 3 months after the last dose of study drug.

Fertile men must agree to use an effective method of birth control during the study and for up to 3 months after the last dose of study drug. Completion of previous anti-cancer therapy at least 2 weeks before study drug initiation. Major surgical procedure, open biopsy excluding skin cancer resection , or significant traumatic injury within 14 days of initiating study drug or anticipation of the need for major surgery during the study.

Uncontrolled intercurrent illness. Patients with colorectal cancer or pancreatic cancer Active secondary malignancy unless the malignancy is not expected to interfere with the evaluation of safety and is approved by the Medical Monitor. Refractory nausea and vomiting, malabsorption, external biliary shunt, or significant bowel resection that would preclude adequate absorption.

Clinically significant cardiac disease.